The resist pattern depends on the photomask pattern and the polarity of resist. . In addition, metal ion containing (MIC) developers are available to those customers that continue to use this technology. Positive photoresists are able to maintain their size and pattern as the photoresist developer solvent doesn't permeate the areas that have not been exposed to the UV light. A patterned mask is then applied to the surface to block light, so that . This includes chemicals mentioned, as reported by PubChem contributors, as well as other . resist surface immediately as the developer is applied. We supply solvents and solvent blends to many markets, including microelectronic, aerospace, biotechnology, pharmaceutical and optics, for such applications as: Basic cleaning in semiconductor and related high-purity processes. Schedule. Optical Lithography Resources - The KNI Lab at Caltech Model Number: GE-S400D. AZ ® Developer (MIC) is optimized for minimum Al attack. Fill later. Corporate HeadquarTers. Photoresist Developer. Photoresist Developers - Dry Film, Liquid Resists, Solder Mask AZ 5214E Photoresist. For a positive resist, exposed areas of the resist become soluble in developer, the unexposed areas remain insoluble. TMAH is a strong base and hazardous by ingestion, inhalation, skin (dermal) exposure and eye contact. Incompatible Materials: III-V, Liftoff Processes, Corrosive Etching (Except Developer), Au, Ag, Hg, Cu Developers, Au, Ag, Hg, Cu films. Get it as soon as Wed, Apr 13. . Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) The P9000 photoresist coater and developer cluster system is a state-of-the-art spin coater tool that can be customized to meet the most demanding of process requirements. AZ Kwik Strip is a unique safe solvent, neutral pH stripper that removes photoresist with no attack on highly sensitive substrates.